William N. Partlo: search on Z-Library

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1

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Optical/Laser Microlithography II - Effects of Line Narrowing and Collimation on Excimer Radiation at 248nm

Partlo, William N., Spence, Chris A., Oldham, William G., Lin, Burn J.

Year:

1989

Language:

english

File:

PDF, 13.70 MB

english, 1989

2

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Production-ready 2-kHz KrF excimer laser for DUV lithography

Myers, Dave, Watson, Tom A., Das, Palash P., Padmabandu, Gunasiri G., Zambon, Paolo, Hofmann, Thomas, Partlo, William N., Hysham, Christopher, Dunning, Richard, Van den Hove, Luc

Year:

1999

Language:

english

File:

PDF, 551 KB

english, 1999

3

Development of a Frailty Index for Patients with Coronary Artery Disease

Elizabeth A. Freiheit, David B. Hogan, Misha Eliasziw, Miranda F. Meekes, William A. Ghali, Lisa A. Partlo, Colleen J. Maxwell

Journal:

Journal of the American Geriatrics Society

Year:

2010

Language:

english

File:

PDF, 97 KB

english, 2010

4

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - LPP EUV source development for HVM

Hansson, Björn A. M., Lercel, Michael J., Fomenkov, Igor V., Böwering, Norbert R., Ershov, Alex I., Partlo, William N., Myers, David W., Khodykin, Oleh V., Bykanov, Alexander N., Rettig, Curtis L., Ho

Year:

2006

Language:

english

File:

PDF, 900 KB

english, 2006

5

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Optical/Laser Microlithography VIII - Low cost of ownership KrF excimer laser using a novel pulse power and chamber configuration

Partlo, William N., Sandstrom, Richard L., Fomenkov, Igor V., Das, Palash P., Brunner, Timothy A.

Year:

1995

Language:

english

File:

PDF, 397 KB

english, 1995

6

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - LPP EUV source development for HVM

Brandt, David C., Lercel, Michael J., Fomenkov, Igor V., Ershov, Alex I., Partlo, William N., Myers, David W., Böwering, Norbert R., Bykanov, Alexander N., Vaschenko, Georgiy O., Khodykin, Oleh V., Ho

Year:

2007

Language:

english

File:

PDF, 505 KB

english, 2007

7

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Optical/Laser Microlithography II - Deep-UV Photolithography With a Small-Field 0.6 N.A. 'Microstepper'

Spence, Chris, Oldham, William G., Partlo, William N., Bruning, John H., Markle, David A., Hsu, Richard, Lin, Burn J.

Year:

1989

Language:

english

File:

PDF, 12.25 MB

english, 1989

8

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Laser-produced plasma source system development

Fomenkov, Igor V., Lercel, Michael J., Brandt, David C., Bykanov, Alexander N., Ershov, Alexander I., Partlo, William N., Myers, David W., Böwering, Norbert R., Vaschenko, Georgiy O., Khodykin, Oleh V

Year:

2007

Language:

english

File:

PDF, 863 KB

english, 2007

9

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - ArF lasers for production of semiconductor devices with CD<0.15 μm

Duffey, Thomas P., Embree, Todd J., Ishihara, Toshihiko, Morton, Richard G., Partlo, William N., Watson, Tom A., Sandstrom, Richard L., Van den Hove, Luc

Year:

1998

Language:

english

File:

PDF, 185 KB

english, 1998

10

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Feasibility of highly line-narrowed F2 laser for 157-nm microlithography

Ershov, Alexander I., Duffey, Thomas P., Onkels, Eckehard D., Partlo, William N., Sandstrom, Richard L., Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 277 KB

english, 2000

11

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - High power low cost drive laser for LPP source

Fomenkov, Igor V., Lercel, Michael J., Hansson, Björn A. M., Böwering, Norbert R., Ershov, Alex I., Partlo, William N., Fleurov, Vladimir B., Khodykin, Oleh V., Bykanov, Alexander N., Rettig, Curtis L

Year:

2006

Language:

english

File:

PDF, 731 KB

english, 2006

12

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Characterization Of A UV Resist for 248 nm Lithography

Shacham-Diamand, Yosi Y., Partlo, William N., Oldham, William G., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 4.83 MB

english, 1989

13

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Aerial image measurements on a commercial stepper

Fields, Charles H., Partlo, William N., Oldham, William G., Brunner, Timothy A.

Year:

1994

Language:

english

File:

PDF, 564 KB

english, 1994

14

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-μm line widths

Ershov, Alexander I., Hofmann, Thomas, Partlo, William N., Fomenkov, Igor V., Everage, George, Das, Palash P., Myers, Dave, Van den Hove, Luc

Year:

1998

Language:

english

File:

PDF, 313 KB

english, 1998

15

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Optimization of a dense plasma focus device as a light source for EUV lithography

Fomenkov, Igor V., Partlo, William N., Ness, Richard M., Oliver, Ian R., Melnychuk, Stephan T., Khodykin, Oleh V., Boewering, Norbert R., Engelstad, Roxann L.

Year:

2002

Language:

english

File:

PDF, 330 KB

english, 2002

16

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor

Partlo, William N., Fomenkov, Igor V., Oliver, Ian R., Birx, Daniel L., Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 2.94 MB

english, 2000

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Laser produced plasma light source for EUVL

Fomenkov, Igor V., La Fontaine, Bruno M., Naulleau, Patrick P., Ershov, Alex I., Partlo, William N., Myers, David W., Brown, Daniel, Sandstrom, Richard L., La Fontaine, Bruno, Bykanov, Alexander N., V

Year:

2011

Language:

english

File:

PDF, 1.09 MB

english, 2011

18

Reducing coherence in a fifth-harmonic YAG source (213 nm) for use in microlithography

Partlo, William N.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1991

Language:

english

File:

PDF, 877 KB

english, 1991

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

Fleurov, Vladimir, Rokitski, Slava, Bergstedt, Robert, Ye, Hong, O’Brien, Kevin, Jacques, Robert, Trintchouk, Fedor, Figueroa, Efrain, Cacouris, Theodore, Brown, Daniel, Partlo, William

Year:

2008

Language:

english

File:

PDF, 482 KB

english, 2008

20

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Progress toward use of a dense plamsa focus as a light source for production EUV lithography

Partlo, William N., Fomenkov, Igor V., Ness, Richard M., Oliver, Ian R., Melnychuk, Stephan T., Rauch, John E., Dobisz, Elizabeth A.

Year:

2001

Language:

english

File:

PDF, 1.23 MB

english, 2001

21

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Wavelength stabilization in an excimer laser source using piezoelectric active vibration control

Spangler, Jr., Ronald L., Jacques, Robert N., Brown, Daniel, Algots, J. M., Partlo, William N., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 463 KB

english, 2001

22

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - An Experimental Characterization System for Deep Ultra-Violet (UV) Photoresists

Drako, Dean M., Partlo, William N., Oldham, W. G., Neureuther, A. R., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 443 KB

english, 1989

23

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - EUV (13.5-nm) light generation using a dense plasma focus device

Partlo, William N., Fomenkov, Igor V., Birx, Daniel L., Vladimirsky, Yuli

Year:

1999

Language:

english

File:

PDF, 994 KB

english, 1999

24

Direct aerial image measurement as a method of testing high numerical aperture microlithographic lenses

Partlo, William N.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1993

Language:

english

File:

PDF, 734 KB

english, 1993

25

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Compaction and rarefaction of fused silica with 193-nm excimer laser exposure

Algots, J. Martin, Sandstrom, Richard, Partlo, William N., Maroevic, Petar, Eva, Eric, Gerhard, Michael, Linder, Ralf, Stietz, Frank, Yen, Anthony

Year:

2003

Language:

english

File:

PDF, 276 KB

english, 2003

26

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Design considerations and performance of 1-kHz KrF excimer lasers for DUV lithography

Morton, Richard G., Fomenkov, Igor V., Partlo, William N., Das, Palash P., Sandstrom, Richard L., Fuller, Gene E.

Year:

1996

Language:

english

File:

PDF, 721 KB

english, 1996

27

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Characterization methods for excimer exposure of deep-UV pellicles

Partlo, William N., Oldham, William G., Pol, Victor

Year:

1990

Language:

english

File:

PDF, 560 KB

english, 1990

28

Diffuser speckle model: application to multiple moving diffusers

Partlo, William N., Oldham, William G.

Journal:

Year:

1993

Language:

english

File:

PDF, 759 KB

english, 1993

29

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Performance of very high repetition rate ArF lasers

Hueber, Jean-Marc, Besaucele, Herve, Das, Palash P., Eis, Rick, Ershov, Alexander I., Fleurov, Vladimir B., Gaidarenko, Dmitri, Hofmann, Thomas, Melcher, Paul C., Partlo, William N., Nikolaus, Bernard

Year:

2000

Language:

english

File:

PDF, 387 KB

english, 2000

30

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Optical/Laser Microlithography - Optimizing NA and sigma for subhalf-micrometer lithography

Partlo, William N., Olson, Setha G., Sparkes, Christopher, Connors, James E., Cuthbert, John D.

Year:

1993

Language:

english

File:

PDF, 642 KB

english, 1993

31

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Optical/Laser Microlithography - Quarter-micron lithography using a deep-UV stepper with modified illumination

Yen, Anthony, Cuthbert, John D., Partlo, William N., Palmer, Shane R., Hanratty, Maureen A., Tipton, Michael C.

Year:

1993

Language:

english

File:

PDF, 527 KB

english, 1993

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Laser-produced plasma light source for EUVL

Fomenkov, Igor V., Ershov, Alex I., Partlo, William N., Myers, David W., Sandstrom, Richard L., Böwering, Norbert R., Vaschenko, Georgiy O., Khodykin, Oleh V., Bykanov, Alexander N., Srivastava, Shail

Year:

2010

Language:

english

File:

PDF, 547 KB

english, 2010

33

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - 6 kHz MOPA light source for 193 nm immersion lithography

Gillespie, Walter D., Smith, Bruce W., Ishihara, Toshihiko, Partlo, William N., Ferguson, George X., Simon, Michael R.

Year:

2005

Language:

english

File:

PDF, 412 KB

english, 2005

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Laser-produced plasma light source for EUVL

Fomenkov, Igor V., Brandt, David C., Bykanov, Alexander N., Ershov, Alex I., Partlo, William N., Myers, Dave W., Böwering, Norbert R., Farrar, Nigel R., Vaschenko, Georgiy O., Khodykin, Oleh V., Hoffm

Year:

2009

Language:

english

File:

PDF, 967 KB

english, 2009

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - LPP source system development for HVM

Brandt, David C., La Fontaine, Bruno M., Naulleau, Patrick P., Fomenkov, Igor V., Ershov, Alex I., Partlo, William N., Myers, David W., Sandstrom, Richard L., La Fontaine, Bruno M., Lercel, Michael J.

Year:

2011

Language:

english

File:

PDF, 525 KB

english, 2011

36

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Verification of compaction and rarefaction models for fused silica with 40 billion pulses of 193-nm excimer laser exposure and their effects on projection lens imaging performance

Algots, J. Martin, Smith, Bruce W., Sandstrom, Richard, Partlo, William, Takahashi, Kazuhiro, Ishii, Hiroyuki, Hasegawa, Yasuo

Year:

2004

Language:

english

File:

PDF, 2.18 MB

english, 2004

37

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Laser-produced plasma source system development

Brandt, David C., Chen, Alek C., Lin, Burn, Fomenkov, Igor V., Ershov, Alex I., Yen, Anthony, Partlo, William N., Myers, David W., Böwering, Norbert R., Vaschenko, Georgiy O., Khodykin, Oleh V., Bykan

Year:

2008

Language:

english

File:

PDF, 1.72 MB

english, 2008

38

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Optical/Laser Microlithography - Depth of focus and resolution enhancement of i-line and deep-UV lithography using annular illumination

Partlo, William N., Tompkins, Paul J., Dewa, Paul G., Michaloski, Paul F., Cuthbert, John D.

Year:

1993

Language:

english

File:

PDF, 1.43 MB

english, 1993

39

EUV laser produced plasma source development

Nigel R. Farrar, David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, Norbert R. Bowering, William N. Partlo, David W. Myers, Alexander N. Bykanov, Georgiy O. Vaschenko, Oleh V. Khodykin, Jerzy R. Hoffm

Journal:

Microelectronic Engineering

Year:

2009

Language:

english

File:

PDF, 405 KB

english, 2009

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - LPP source system development for HVM

La Fontaine, Bruno M., Brandt, David C., Fomenkov, Igor V., Ershov, Alex I., Partlo, William N., Myers, David W., Sandstrom, Richard L., Böwering, Norbert R., Vaschenko, Georgiy O., Khodykin, Oleh V.,

Year:

2010

Language:

english

File:

PDF, 1.69 MB

english, 2010

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - LPP source system development for HVM

Brandt, David C., Schellenberg, Frank M., La Fontaine, Bruno M., Fomenkov, Igor V., Ershov, Alex I., Partlo, William N., Myers, David W., Böwering, Norbert R., Farrar, Nigel R., Vaschenko, Georgiy O.,

Year:

2009

Language:

english

File:

PDF, 615 KB

english, 2009

42

Quartz inhomogeneity effects in diffraction-limited deep ultraviolet imaging

Pfau, Anton K., Partlo, William N., Hsu, Richard, Oldham, William G.

Journal:

Year:

1992

Language:

english

File:

PDF, 543 KB

english, 1992

43

SPIE Proceedings [SPIE XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference - Edinburgh, United Kingdom (Sunday 25 August 1996)] XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference - Performance of 1-kHz KrF excimer laser for DUV lithography

Das, Palash P., Morton, Richard G., Fomenkov, Igor V., Partlo, William N., Sandstrom, Richard L., Maley, Cynthia A., Cybulski, Ray, Hall, Denis R., Baker, Howard J.

Year:

1997

Language:

english

File:

PDF, 246 KB

english, 1997

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